International Scientific Journals
of Scientific Technical Union of Mechanical Engineering "Industry 4.0"

Two-dimensional (2D) materials such as graphene and tungsten disulfide (WS₂ ) are promising candidates for gas sensors due to their unique electrical and surface properties. Graphene exhibits high conductivity and mechanical strength, while its oxidized or functionalized forms enhance chemical reactivity and gas adsorption. WS₂ , a semiconducting transition metal dichalcogenide, shows strong surface interactions with gases, enabling sensitive detection even at room temperature.
In this work, graphene and WS₂ thin films were characterized to evaluate surface morphology, uniformity, and structural quality. Graphene films were prepared by chemical vapor deposition (CVD) and transferred onto SiO₂ /Si substrates, while WS₂ films with thicknesses of 20 nm and 50 nm were obtained via CVD and sputtering. Surface analysis using scanning electron microscopy (SEM) and 3D laser microscopy revealed that graphene films are highly uniform and smooth, whereas WS₂ films exhibit thickness-dependent surface roughness and texture. These findings provide insights into the relationship between film morphology and gas sensing performance, highlighting the potential of both materials for sensor applications.

This work presents experimental and theoretical investigation of exposed and developed negative electron resist AR-N 7520 profiles using electron beam lithography system ZBA23 (Raith) at variation of the exposure doses and pre-defined exposure pattern. Several overall geometry quality criteria for the shape of the developed resist profile cross-sections are defined. Empirical models are estimated for the dependence of overall geometry characteristics of the obtained resist profiles on the exposure dose. These overall quality characteristics are used for defining of technological requirements for the formed profiles and for obtaining optimal regimes by multicriterial optimization.