International Scientific Journals
of Scientific Technical Union of Mechanical Engineering "Industry 4.0"

Electron beam lithography (EBL) is a key technology for the fabrication of new generation integral circuits and devices of electronics, photonics and nano-engineering. The computer simulation of the processes of electron exposure and development of the resist profiles in EBL is important for the optimization of this expensive technology process, due to the expensive equipment used in microelectronic fabrication, the use of sophisticated materials and the long chain of sequential steps required to obtain the desired microand nano-structure. In this work investigation of the exposure and the development of Poly-methyl methacrylate resist (PMMA) with 100 nm thickness on Si substrate is presented. Different simulation techniques are implemented for the estimation of the distribution of the absorbed energy in the sample during electron beam exposure and for the development of the resist profile. Results from Monte Carlo simulation softwares CASINO, TREM, SELID are presented.

This article discusses a modelling approach for the welded seam form obtained by electron beam welding based on experimental data and types of mathematical functions. The process of electron beam welding is carried out by dividing the electron beam into two parts, resulting in the formation of two liquid baths. The samples that are welded are made of stainless steel with a change in process parameters: the distance between the two electron beam parts and the ratio of the power distribution between the two beam parts, the frequency of the deflection signal, the beam current, and the welding speed. Focusing current is of constant value. The weld cross sections shown in different process parameters are used to evaluate their shape using standard mathematical function – Gaussian functions.