It has been established that in the study of a solid surface by atomic force microscopy, the hydrophobic interaction is more advantageous due to a decrease in the interaction forces between the probe and the liquid adsorbed on the surface under study. Despite the fact that silicon is a hydrophobic material, it has been shown that the material acquires hydrophilic properties in air, as a result of which the use of carbon-modified probes has been proposed. An approach to experimental statistical modeling is proposed, based on the experiment planning method, which shows that with a scanning speed of 12 μm / s, a scanning step of up to 82 nm and a delay time before scanning of 6 ms, the interaction force between the probe and the adsorbed liquid reaches minimum values. As a result of the research, it was found that with a decrease in the scanning speed, a scanning step and an increase in the delay time of the probe before measurement, the interaction between the probe and the liquid membrane is hydrophobic. It is shown that by changing the initial parameters, it is possible to control the hydrophobic interaction between the probe and the liquid. It has been established that increased air humidity leads to hydrophilic interaction. This is due to the increase in the thickness of the adsorbed liquid layer on the surface under study.
Author: Bondarenko M.
CONTROL OF SPATIAL CHARACTERISTICS OF THE RIBBON-SHAPED ELECTRON STREAM IN THE PROCESS OF PROCESSING OPTICAL COVERINGS OF OPTOELECTRONICS PRODUCTS
The paper develops a methodology for controlling the spatial characteristics of a ribbon-shaped electron stream by determining the width of the low-energy ribbon-shaped electron stream and its concentration coefficient as a function of the distance of the electron gun to the processing object and the subsequent highly effective adjustment of the electron-optical system of the electron gun with a ribbonshaped stream shape during processing of optical coatings of optoelectronics products. It is established that the dependence of the width of the electron stream and the coefficient of its concentration at different distances from the object are nonlinear. The possibility of controlling the electron stream by adjusting the specific power and the distance to the processed object directly during the processing is shown, which allows qualitatively improving the metrological indexes of the processed articles: increase the accuracy of processing by 3-5%, the convergence of the results – by 15-18%, and also increase the stability of the parameters of the electron stream 1,6-2,1 times.
THE INVESTIGATION OF THE NANORELIEFS OF OPTICAL ELEMENTS OF MEASURING INSTRUMENTS, WHICH MODIFIED BY ELECTRONBEAM MICROPROCESSING
The results of microprocessing by the ribbon-shaped electron beam of the elements of optical measuring instruments (the material of such elements – K8 glass) with the initial nanorelief of surfaces 15-22 nm after industrial grinding and polishing are presented. Based on the results of studies using a computerized complex control system based on an atomic force microscope, it was established that after electron-beam microprocessing, the nanorelief of optical elements of measuring instruments decreased to 1.5-2.2 nm, satisfying to the requirements put forward to their surfaces.
PECULIARITIES OF METALIZED SURFACES MODIFICATION OF SILICON ELEMENTS OF MICROELECTROMECHANICAL SYSTEMS WITH LOW-POWER ELECTRONIC FLOW
The practical possibility of the atomic force microscopy method to evaluate uniformity of thin metal coatings on silicon wafers after electronic processing has been shown in the paper. It is established that after processing of metallized surfaces of silicon plates Kp0 by an electronic flow of continuous form, the microroughness decreases in 10-15 times and the Adhesive strength increases in 1.8-2 times. At the same time, it is noted that the surface of metal coatings on silicon after electronic processing has a more homogeneous structure and released from microdefects, unlike metallized coatings without electronic processing.
INFLUENCE OF PARAMETERS BY ELECTRONIC RAY ON PROPERTIES OF SUPERFICIAL LAYERS OF OPTICAL ELEMENTS OF EXACT INSTRUMENT-MAKING
In the article are presented the results of researches of action of electronic ray on optical elements. The analysis of surfaces of elements before and after a beam-processing the method of atomic-force microscopy shows that in first case the height of microburries makes 50…60 nm, and in second case goes down to the level of 0,5…1 nm. Influence of parameters of electronic ray is set on the height of microburries: the increase of closeness of thermal influence of ray in 6 times results in diminishing of height of microburries in 3…4 time, diminishing of rate of movement of ray in 5 times results in diminishing of height of microburries in 5…6 times. It is shown that by optimization of the modes of beam-processing of elements it is possible substantially to improve (to 50…60%) properties of its superficial layers and basic operating descriptions of devices. Thus probability of destruction of elements and death devices in the conditions of intensive external thermal influences, devices can undergo that at their storage, portage and application, diminishes in 1,5…2 time.