International Scientific Journals
of Scientific Technical Union of Mechanical Engineering "Industry 4.0"

Plasma-based ion implantation (PBII) is a surface modification method, which applies a negative high-voltage pulse to a sample in plasma. Ions are implanted uniformly by reducing the width of the ion sheath formed near the sample and by aligning the sheath shape more with the sample for complexly shaped samples. This method is considered a potentially effective surface treatment method for various shapes of objects. This study investigated the PBII method to explore its potential use as a food processing device. The research samples were pork belly and cabbage. The investigation results showed decreased bacteria viability, although the sample temperature at the treatment time was less than 40 °C. Additionally, the plasma treatment could not decrease the vitamin C content. Furthermore, fine holes could be created on the sample surface. These results indicate that PBII treatment is usable in food processing to improve the permeability of seasoning solutions while ensuring food safety and nutrient stability.

Plasma basic ion implantation (PBII) with high negative voltage pulses has been applied to test specimens in a sterilization process as a technique suitable for three-dimensional workpieces. Pulsed high negative voltage was applied to the electrode in this process at the gas pressure of oxygen. It was reported that the PBII process reduced the numbers of active Bacillus pumilus cells using self-ignited plasma N₂ gas generated by only pulsed voltages. The number of bacteria survivors was reduced by 10^-5with a few min exposure. As the ion energy is the most important processing parameter, a simple method to estimate the oxygen ion energy calculated using distribution for oxygen in Si implanted by PBII was estimated. In this work, the Effect of Plasma Density on Residual Bacterial Number and Applied Voltage is studied.