Industry 4.0
Vol. 10 (2025), Issue 1, pg(s) 14-17

DOMINANT TECHNOLOGIES IN “INDUSTRY 4.0”

Simulation-Based Analysis for Optimization of Sterilization Devices in Plasma-Based Ion Implantation Technology

  • 1 Hiroshima Institute of Technology, Hiroshima, Japan

Abstract

The electric potential distribution is critical in Plasma-Based Ion Implantation (PBII), as it directly influences the energy and spatial distribution of implanted ions. Understanding the effects of key parameters, such as the applied voltage and gas pressure, on the formation of the electric potential distribution is essential for optimizing PBII-based sterilization. In this study, plasma simulations were conducted using PEGASUS (PEGASUS Software Co., Ltd.) to examine variation in the electric potential distribution under different operating conditions. The analysis focused on changes in the electric potential distribution and ion density in response to variations in the applied voltage. The results indicated that, increasing the applied voltage, led to an expansion of the negative potential region to approximately −500 V, highlighting the role of positive ions play a key role in the sterilization process. Furthermore, enclosing non–sample areas with a grounded structure reduced unnecessary plasma generation, potentially improving energy efficiency during sterilization experiments.

Keywords

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