Feasibility of food processing treatment using plasma-based ion implantation method

  • 1 Hiroshima Institute of Technology - Hiroshima, Japan
  • 2 Institute of Electronics, Bulgarian Academy of Sciences Sofia, Bulgaria


Plasma-based ion implantation (PBII) is a surface modification method, which applies a negative high-voltage pulse to a sample in plasma. Ions are implanted uniformly by reducing the width of the ion sheath formed near the sample and by aligning the sheath shape more with the sample for complexly shaped samples. This method is considered a potentially effective surface treatment method for various shapes of objects. This study investigated the PBII method to explore its potential use as a food processing device. The research samples were pork belly and cabbage. The investigation results showed decreased bacteria viability, although the sample temperature at the treatment time was less than 40 °C. Additionally, the plasma treatment could not decrease the vitamin C content. Furthermore, fine holes could be created on the sample surface. These results indicate that PBII treatment is usable in food processing to improve the permeability of seasoning solutions while ensuring food safety and nutrient stability.



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