International Scientific Journals
of Scientific Technical Union of Mechanical Engineering "Industry 4.0"

The article presents the results of a study of the influence of the main technical parameters of a ribbon electron flow on the microrelief of the surface of optical glass. A mathematical apparatus has been developed that allows the processing of probe characteristics obtained by sensing the energy parameters of a paraxial electron flow. The dependence of the influence of the main technical parameters (shape, size and distribution of current density) of a low-energy electronic stream of ribbon form on the microrelief of the surface of an optical glass of the crown variety has been established. This made it possible to evaluate the interaction of the electron flow with the surface of the optical glass. It was also found that the useful current of the electron flow is about 30% of the total emission current of the cathode of the electron gun. It is shown that the following factors can influence the accuracy of determining the technical parameters of a ribbon electron flow by sounding: a decrease in the diameter of the probes under the influence of the electron flow and heating of the probes during measurement. The total error of the probe method for determining the current density of the electron flow does not exceed 8%. Using atomic force microscopy, it was established that after processing the surfaces of optical glass of the crown variety with a low-energy electron-beam of a ribbon-shaped shape, provided that the rational shape, size and distribution of current density both in the working space and on the treated surface are reduced by irregularities from 40-75 nm to 3.5-5 nm. However, it was noted that the surface of the glass after electron flow treatment has a more uniform structure and is free from microdefects, in contrast to surfaces without electron flow processing

The results of microprocessing by the ribbon-shaped electron beam of the elements of optical measuring instruments (the material of such elements – K8 glass) with the initial nanorelief of surfaces 15-22 nm after industrial grinding and polishing are presented. Based on the results of studies using a computerized complex control system based on an atomic force microscope, it was established that after electron-beam microprocessing, the nanorelief of optical elements of measuring instruments decreased to 1.5-2.2 nm, satisfying to the requirements put forward to their surfaces.

The results of microprocessing by the ribbon-shaped electron beam of the elements of optical measuring instruments (the material of such elements – K8 glass) with the initial nanorelief of surfaces 15-22 nm after industrial grinding and polishing are presented. Based on the results of studies using a computerized complex control system based on an atomic force microscope, it was established that after electron-beam microprocessing, the nanorelief of optical elements of measuring instruments decreased to 1.5-2.2 nm, satisfying to the requirements put forward to their surfaces.

The practical possibility of the atomic force microscopy method to evaluate uniformity of thin metal coatings on silicon wafers after electronic processing has been shown in the paper. It is established that after processing of metallized surfaces of silicon plates Kp0 by an electronic flow of continuous form, the microroughness decreases in 10-15 times and the Adhesive strength increases in 1.8-2 times. At the same time, it is noted that the surface of metal coatings on silicon after electronic processing has a more homogeneous structure and released from microdefects, unlike metallized coatings without electronic processing.